Nano-Strip®

210034
10135-756CS 389.71 USD
10135-756
Nano-Strip®
Nano-Strip®

Nano-Strip® is a stabilized formulation of sulfuric acid and hydrogen peroxide compounds. It removes positive and nega­tive resists and other organic materials used in various applications of semiconductor photolithography. It contains high purity reagents required for high yield semiconductor manufacturing.

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Specification Test Results

Assay (H2SO5) 4.00 - 5.15%
Aluminum 10 ppb
Antimony 10 ppb
Arsenic 10 ppb
Barium 10 ppb
Beryllium 10 ppb
Boron 10 ppb
Cadmium 10 ppb
Calcium 10 ppb
Chromium 10 ppb
Cobalt 10 ppb
Copper 10 ppb
Gallium 10 ppb
Germanium 10 ppb
Gold 10 ppb
Iron 20 ppb
Lead 10 ppb
Lithium 10 ppb
Magnesium 10 ppb
Manganese 10 ppb
Molybdenum 10 ppb
Nickel 10 ppb
Phosphorus 50 ppb
Potassium 30 ppb
Silver 10 ppb
Sodium 20 ppb
Strontium 10 ppb
Tin 10 ppb
Titanium 10 ppb
Vanadium 10 ppb
Zinc 10 ppb
Zirconium 10 ppb
0.50µ Particle Count 100 par/ml
1.00µ Particle Count 10 par/ml

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