Nano-Strip®
210034
10135-756CS
389.71
USD
10135-756
Nano-Strip®
Nano-Strip®
Nano-Strip® is a stabilized formulation of sulfuric acid and hydrogen peroxide compounds. It removes positive and negative resists and other organic materials used in various applications of semiconductor photolithography. It contains high purity reagents required for high yield semiconductor manufacturing.
Specification Test Results
Assay (H2SO5) | 4.00 - 5.15% |
Aluminum | 10 ppb |
Antimony | 10 ppb |
Arsenic | 10 ppb |
Barium | 10 ppb |
Beryllium | 10 ppb |
Boron | 10 ppb |
Cadmium | 10 ppb |
Calcium | 10 ppb |
Chromium | 10 ppb |
Cobalt | 10 ppb |
Copper | 10 ppb |
Gallium | 10 ppb |
Germanium | 10 ppb |
Gold | 10 ppb |
Iron | 20 ppb |
Lead | 10 ppb |
Lithium | 10 ppb |
Magnesium | 10 ppb |
Manganese | 10 ppb |
Molybdenum | 10 ppb |
Nickel | 10 ppb |
Phosphorus | 50 ppb |
Potassium | 30 ppb |
Silver | 10 ppb |
Sodium | 20 ppb |
Strontium | 10 ppb |
Tin | 10 ppb |
Titanium | 10 ppb |
Vanadium | 10 ppb |
Zinc | 10 ppb |
Zirconium | 10 ppb |
0.50µ Particle Count | 100 par/ml |
1.00µ Particle Count | 10 par/ml |
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About VWR
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