Buffered oxide etch 7:1

62058
89400-760CS 561.4 USD
89400-760
Buffered oxide etch 7:1
Buffered oxide etch

Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.

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Specification Test Results

Assay (HF) 6.23 - 6.48%
Assay (NH4F) 34.30 - 35/30%
Color 10
Appearance Conform
Chloride 2000 ppb
Nitrate 5000 ppb
Phosphate 500 ppb
Sulfate 1000 ppb
Aluminum 20 ppb
Antimony 5 ppb
Arsenic 5 ppb
Barium 10 ppb
Beryllium 10 ppb
Bismuth 10 ppb
Boron 10 ppb
Cadmium 10 ppb
Calcium 10 ppb
Chromium 10 ppb
Cobalt 10 ppb
Copper 10 ppb
Gallium 10 ppb
Germanium 10 ppb
Gold 10 ppb
Iron 50 ppb
Lead 20 ppb
Lithium 10 ppb
Magnesium 20 ppb
Manganese 10 ppb
Molybdenum 10 ppb
Nickel 10 ppb
Niobium 50 ppb
Platinum 10 ppb
Potassium 25 ppb
Silver 10 ppb
Sodium 50 ppb
Strontium 10 ppb
Thallium 10 ppb
Tin 20 ppb
Titanium 20 ppb
Vanadium 10 ppb
Zinc 10 ppb
Zirconium 10 ppb
0.5µ Particle Count 160 par/ml
1.0µ Particle Count 8 par/ml

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