Buffered oxide etch 7:1
62058
89400-760CS
561.4
USD
89400-760
Buffered oxide etch 7:1
Buffered oxide etch
Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.
Specification Test Results
Assay (HF) | 6.23 - 6.48% |
Assay (NH4F) | 34.30 - 35/30% |
Color |
|
Appearance | Conform |
Chloride | 2000 ppb |
Nitrate | 5000 ppb |
Phosphate | 500 ppb |
Sulfate | 1000 ppb |
Aluminum | 20 ppb |
Antimony | 5 ppb |
Arsenic | 5 ppb |
Barium | 10 ppb |
Beryllium | 10 ppb |
Bismuth | 10 ppb |
Boron | 10 ppb |
Cadmium | 10 ppb |
Calcium | 10 ppb |
Chromium | 10 ppb |
Cobalt | 10 ppb |
Copper | 10 ppb |
Gallium | 10 ppb |
Germanium | 10 ppb |
Gold | 10 ppb |
Iron | 50 ppb |
Lead | 20 ppb |
Lithium | 10 ppb |
Magnesium | 20 ppb |
Manganese | 10 ppb |
Molybdenum | 10 ppb |
Nickel | 10 ppb |
Niobium | 50 ppb |
Platinum | 10 ppb |
Potassium | 25 ppb |
Silver | 10 ppb |
Sodium | 50 ppb |
Strontium | 10 ppb |
Thallium | 10 ppb |
Tin | 20 ppb |
Titanium | 20 ppb |
Vanadium | 10 ppb |
Zinc | 10 ppb |
Zirconium | 10 ppb |
0.5µ Particle Count | 160 par/ml |
1.0µ Particle Count | 8 par/ml |
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