Buffered oxide etch 12:2:5

62054
89400-752CS 608.31 USD
89400-752
Buffered oxide etch 12:2:5
Buffered oxide etch

Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.

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Specification Test Results

Assay (HF) 5.35 - 5.65%
Assay (NH4F) 25.30 - 26.30%
Color 10
Appearance Conform
Chloride 2500 ppb
Nitrate 5000 ppb
Phosphate 500 ppb
Sulfate 1500 ppb
Aluminum 25 ppb
Antimony 10 ppb
Arsenic 10 ppb
Boron 25 ppb
Calcium 25 ppb
Chromium 25 ppb
Copper 25 ppb
Gold 25 ppb
Iron 25 ppb
Lead 25 ppb
Magnesium 25 ppb
Manganese 25 ppb
Nickel 25 ppb
Potassium 25 ppb
Sodium 25 ppb
Tin 25 ppb
Titanium 25 ppb
Zinc 25 ppb
0.2µ Particle Count 3000 par/ml
0.5µ Particle Count 500 par/ml
1.0µ Particle Count 25 par/ml

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