Sulfuric acid ≥96%, Gigabit®

Supplier: KMG

64105 64106
71009-382CS 338.6 USD
71009-382 71009-534
Sulfuric acid ≥96%, Gigabit®
Sulphuric acid

Sulfuric Acid is used in semiconductor processing to remove residual organic contamination prior to metalization steps.
Store at less than 109⁰ F

Formula: H₂SO₄
MW: 98.08 g/mol
Boiling Pt: ∼335 °C (1013 hPa)
Melting Pt: 3 °C
Density: 1.84 g/cm³ (20 °C)
MDL Number: MFCD00064589
CAS Number: 7664-93-9
UN: 1830
ADR: 8,II

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Specification Test Results

Assay (H2SO4) 95.50 - 97.00%
Assay (H2O) 3.00 - 5.00%
Color 6 APHA
Appearance Conforms
Substance Reducing KMnO4 Conforms
Chloride (Cl) 100 ppb
Nitrrate (NO3) 100 ppb
Phosphate (PO4) 100 ppb
Aluminum (Al) 2 ppb
Antimony (Sb) 1 ppb
Arsenic (As) 1 ppb
Barium (Ba) 1 ppb
Beryllium (Be) 1 ppb
Bismuth (Bi) 1 ppb
Boron (B) 1 ppb
Cadmium (Cd) 1 ppb
Arsenic (As) 1 ppb
Chromium (Cr) 1 ppb
Cobalt (Co) 1 ppb
Copper (Cu) 1 ppb
Gallium (Ga) 1 ppb
Germanium (Ge) 1 ppb
Gold (Au) 1 ppb
Iron (Fe) 5 ppb
Lead (Pb) 1 ppb
Lithium (Li) 1 ppb
Magnesium (Mg) 1 ppb
Manganese (Mn) 1 ppb
Molybdenum (Mo) 1 ppb
Nickel (Ni) 1 ppb
Niobium (Nb) 1 ppb
Potassium (K) 2 ppb
Silicon (Si) 5 ppb
Silver (Ag) 1 ppb
Sodium (Na) 2 ppb
Strontium (Sr) 1 ppb
Tantalum (Ta) 1 ppb
Thallium (Tl) 1 ppb
Tin (Sn) 1 ppb
Titanium (Ti) 1 ppb
Vanadium (V) 1 ppb
Zinc (Zn) 2 ppb
Tantalum (Ta) 1 ppb
0.065μ Particle Count 20000 par/ml
0.1μ Particle Count 10000 par/ml
0.15μ Particle Count 2000 par/ml
0.2μ Particle Count 250 par/ml
0.5μ Particle Count 25par/ml

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